Conférence du Professeur David Emslie (McMaster)

Titre: Organomanganese Complexes and Reactivity: From Manganese Metal ALD (Atomic Layer Deposition) to Fundamental Reactivity Studies.

Endroit : Pavillon J.-Armand Bombardier, salle 1035 à 11 h

Hôte : Frank Schaper

Cette conférence sera prononcée (en anglais)par le Professeur David Emslie du département de chimie de l'Université McMaster.

Résumé:

ALD (Atomic Layer Deposition) is a technique for depositing, under mild conditions, ultrathin films of various materials (e.g. metals, oxides, sulfides etc.) that that have high thickness uniformity and conform precisely to the topography of the substrate surface, as required in future generations of computer microprocessors.1,2 For example, a current Intel microprocessor contains at least 50 of the 81 non-radioactive elements in the periodic table3 in a variety of different forms, including pure metals. However, ALD relies upon surface-based reactions between pairs of molecules (different molecules for each target material), and for many target materials, suitable molecules and ALD reactivities have yet to be conceived or developed. This is the case for almost all electropositive metals, since reactivity must be developed to reduce the metal in a positive oxidation state, in an ALD precursor molecule, to the zero oxidation state in the pure element. This seminar will describe (a) our efforts to develop the first methods for manganese metal ALD by harnessing the high reactivity of manganese(II) alkyl4 and allyl5 complexes, and (b) subsequent fundamental reactivity studies stemming from this ALD research, with a focus on manganese(I)/(III) complexes with Mn–H and Mn–Si linkages.

_{(1) Atomic Layer Deposition of Nanostructured Materials, Wiley-VCH: Weinheim, Germany, 2012.}

_{(2) Emslie, D. J. H.; Chadha, P.; Price, J. S. Coord. Chem. Rev. 2013, 257, 3282.}

_{(3) C&E News, June 27, 2005, 26.}

_{(4) Price, J. S.; Chadha, P.; Emslie, D. J. H. Organometallics 2016, 35, 168.}

_{(5) Chadha, P.; Emslie, D. J. H.; Jenkins, H. A. Organometallics 2014, 33, 1467.}

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